[This page is no longer
being updated. Go to my
homepage for my current contact information or to my list of publications
download papers. -- SCD]
Image Metrology and Edge Detection
Image metrology is the task of determining dimensional information
of object features within image data. An imporant application of
this task is in semiconductor lithography, in which one must determine
the precise position of a partially-processed silicon wafer in order to
align it with a projected mask image containing feature information for
the next processing step. Edge detection is a sub-task within image
metrology in which linear feature of an object -- ``edges'' -- are identified.
Image metrology and edge detection were topics that I
focused on during portions of my graduate work at Stanford. Below
are the conference papers that I have written on the topic. From
these studies, I became motivated to understand the effects of nonlinearities
within gradient adaptive algorithms, the subject of my Ph.D. thesis.
Publications on Image Metrology and Edge Detection
-- Scott C. Douglas
S.C. Douglas and T.H.-Y. Meng, ``An Adaptive Edge Detection Method Using
a Modified Sigmoid-LMS Algorithm,'' Proc. 23rd Asilomar Conference on
Signals, Systems, and Computers,Pacific Grove, CA, vol. I, pp. 252-256,
S.C. Douglas and T.H.-Y. Meng, ``Design of Edge Detection Templates Using
a Neural Network,'' Proc. International Joint Conference on Neural Networks,
Washington, DC, vol. II, pp. 331-334, January 1990.
S.C. Douglas, T.H.-Y. Meng, and R.F.W. Pease, ``Nonlinear Adaptive Edge
Detection Techniques for Wafer Inspection and Alignment,'' Proc. SPIE
Integrated Circuit Metrology, Inspection, and Process Control IV, San
Jose, CA, vol. 1291, pp. 130-138, March 1990.
S.C. Douglas, ``A Frequency-Domain Subpixel Position Estimation Algorithm
for Overlay Measurement,'' Proc. SPIE Integrated Circuit Metrology,
Inspection, and Process Control VII, San Jose, CA, vol. 1926, pp. 402-411,